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Discovery of a Single-Band Mott Insulator in a van der Waals Flat-Band Compound

Shunye Gao et al.
Phys. Rev. X 13, 041049 – Published 13 December 2023
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Abstract

The Mott insulator provides an excellent foundation for exploring a wide range of strongly correlated physical phenomena, such as high-temperature superconductivity, quantum spin liquid, and colossal magnetoresistance. A Mott insulator with the simplest degree of freedom is an ideal and highly desirable system for studying the fundamental physics of Mottness. In this study, we have unambiguously identified such an anticipated Mott insulator in a van der Waals layered compound Nb3Cl8. In the high-temperature phase, where interlayer coupling is negligible, density functional theory calculations for the monolayer of Nb3Cl8 suggest a half-filled flat band at the Fermi level, whereas angle-resolved photoemission spectroscopy experiments observe a large gap. This observation is perfectly reproduced by dynamical mean-field theory calculations considering strong electron correlations, indicating a correlation-driven Mott insulator state. Since this half-filled band derived from a single 2a1 orbital is isolated from all other bands, the monolayer of Nb3Cl8 is an ideal realization of the celebrated single-band Hubbard model. Upon decreasing the temperature, the bulk system undergoes a phase transition, where structural changes significantly enhance the interlayer coupling. This results in a bonding-antibonding splitting in the Hubbard bands, while the Mott gap remains dominant. Our discovery provides a simple and seminal model system for investigating Mott physics and other emerging correlated states.

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  • Received 2 March 2023
  • Revised 19 October 2023
  • Accepted 31 October 2023

DOI:https://doi.org/10.1103/PhysRevX.13.041049

Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.

Published by the American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

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Popular Summary

Mott insulators, a distinctive class of materials where the insulating state arises from strong electron-electron interactions, serve as a solid foundation for exploring a diverse array of strongly correlated physical phenomena, such as high-temperature superconductivity, quantum spin liquids, and colossal magnetoresistance. The most fundamental model for understanding Mott physics is the celebrated single-band Hubbard model, which considers electrons in a single band consisting of a single orbital. However, low-energy excitations in real Mott insulators tend to be intricate, leading to challenges and controversies in both experimental validation and theoretical analysis. Here, we report a textbook example of the single-band Mott insulator within the van der Waals compound Nb3Cl8.

In the high-temperature phase, where interlayer coupling is negligible, the perfect agreement between our experiments and calculations unequivocally identifies that the insulating behavior of the monolayer of Nb3Cl8 arises from strong electron-electron interactions. A half-filled flat band, previously pinned at the Fermi level, splits into the upper and lower Hubbard bands, with the Fermi level sandwiched between them. Since this half-filled band, derived from a single orbital, is isolated from all other bands, the monolayer of Nb3Cl8 is an ideal realization of the single-band Hubbard model. Upon decreasing the temperature, the interlayer coupling is significantly enhanced due to a structural phase transition. This results in band splitting within the Hubbard bands of the bulk system, while the insulating behavior is still dominated by Mott physics.

This discovery provides a simple yet powerful model system for investigating Mott physics and other emerging correlated states. It is helpful to enhance our understanding of correlated physical phenomena and has potential for future technological applications.

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Vol. 13, Iss. 4 — October - December 2023

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