Li et al. Reply

Yufan Li, N. Kanazawa, X. Z. Yu, F. Kagawa, and Y. Tokura
Phys. Rev. Lett. 112, 059702 – Published 4 February 2014

Abstract

A Reply to the Comment by T. L. Monchesky et al.

  • Figure
  • Received 18 October 2013

DOI:https://doi.org/10.1103/PhysRevLett.112.059702

© 2014 American Physical Society

Authors & Affiliations

Yufan Li1,2, N. Kanazawa1, X. Z. Yu3, F. Kagawa1,3, and Y. Tokura1,3

  • 1Department of Applied Physics and Quantum Phase Electronics Center (QPEC), University of Tokyo, Tokyo 113-8656, Japan
  • 2State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200433, China
  • 3RIKEN Center for Emergent Matter Science (CEMS), Wako 351-0198, Japan

Comments & Replies

Comment on “Robust Formation of Skyrmions and Topological Hall Effect Anomaly in Epitaxial Thin Films of MnSi”

T. L. Monchesky, J. C. Loudon, M. D. Robertson, and A. N. Bogdanov
Phys. Rev. Lett. 112, 059701 (2014)

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Original Article

Robust Formation of Skyrmions and Topological Hall Effect Anomaly in Epitaxial Thin Films of MnSi

Yufan Li, N. Kanazawa, X. Z. Yu, A. Tsukazaki, M. Kawasaki, M. Ichikawa, X. F. Jin, F. Kagawa, and Y. Tokura
Phys. Rev. Lett. 110, 117202 (2013)

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Vol. 112, Iss. 5 — 7 February 2014

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