Anisotropic Crystalline Organic Step-Flow Growth on Deactivated Si Surfaces

Sean R. Wagner, Richard R. Lunt, and Pengpeng Zhang
Phys. Rev. Lett. 110, 086107 – Published 20 February 2013
PDFHTMLExport Citation

Abstract

We report the first demonstration of anisotropic step-flow growth of organic molecules on a semiconducting substrate using metal phthalocyanine thermally deposited on the deactivated Si(111)-B 3×3 R30° surface. With scanning probe microscopy and geometric modeling, we prove the quasiepitaxial nature of this step-flow growth that exhibits no true commensurism, despite a single dominant long-range ordered relationship between the organic crystalline film and the substrate, uniquely distinct from inorganic epitaxial growth. This growth mode can likely be generalized for a range of organic molecules on deactivated Si surfaces and access to it offers new potential for the integration of ordered organic thin films in silicon-based electronics.

  • Figure
  • Figure
  • Figure
  • Figure
  • Received 17 August 2012

DOI:https://doi.org/10.1103/PhysRevLett.110.086107

© 2013 American Physical Society

Authors & Affiliations

Sean R. Wagner1, Richard R. Lunt2, and Pengpeng Zhang1,*

  • 1Department of Physics and Astronomy, Michigan State University, East Lansing, Michigan 48824-2320, USA
  • 2Department of Chemical Engineering and Materials Science, Michigan State University, East Lansing, Michigan 48824-2320, USA

  • *zhang@pa.msu.edu

Article Text (Subscription Required)

Click to Expand

Supplemental Material (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 110, Iss. 8 — 22 February 2013

Reuse & Permissions
Access Options
CHORUS

Article Available via CHORUS

Download Accepted Manuscript
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review Letters

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×