Separation of low- and high-temperature contributions to the exchange bias in Ni81Fe19-NiO thin films

J. McCord and S. Mangin
Phys. Rev. B 88, 014416 – Published 16 July 2013

Abstract

The temperature and time dependence of exchange bias for as-deposited Ni81Fe19-NiO films is studied. Using various cooling and measurement protocols, different contributions to the exchange anisotropy are separated. Depending on the cooling procedure, a strong increase or a controlled reversal of sign of exchange bias field is achieved at lower temperatures far away from the antiferromagnetic blocking temperature. The behavior is explained in terms of antiferromagnetic grain instability and the influence of the interfacial spin structure, the latter freezing at very low temperatures.

  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Received 1 March 2013

DOI:https://doi.org/10.1103/PhysRevB.88.014416

©2013 American Physical Society

Authors & Affiliations

J. McCord

  • Institute for Materials Science, Kiel University, Germany

S. Mangin

  • Institute Jean Lamour, CNRS UMR 7198 - Université de Lorraine, Vandoeuvre lés Nancy, France

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 88, Iss. 1 — 1 July 2013

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×