Twinning and dislocation pileups in heavily implanted LiNbO3

Avishai Ofan, Ophir Gaathon, Lihua Zhang, Kenneth Evans-Lutterodt, Sasha Bakhru, Hassaram Bakhru, Yimei Zhu, David Welch, and Richard M. Osgood, Jr.
Phys. Rev. B 83, 064104 – Published 14 February 2011
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Abstract

The nature of a striking pattern of extended defects formed by very high dose implantation of helium in a complex oxide, for example, ferroelectricz-cut LiNbO3, is studied. After irradiation, a high concentration of defects is found to collect and create a network of thick prismatic planar defects, which have typical dimensions of ∼1.5 μm and 200 nm parallel and perpendicular to the z axis, respectively. This defect network and its effect on the lattice were studied using a set of x-ray and electron microscopy probes of the lattice structure and spatial variation. Optical microscopy shows that there is strong temperature dependence for forming the network; the density of these extended defects reaches a maximum value for an annealing temperature of 250 °C but is fully eliminated by a temperature of 380 °C. High-resolution transmission electron microscopy studies indicate that these extended defects are probably localized twinning and dislocation pileups due to plastic deformation of the lattice to relieve He-implantation-induced stress. During this deformation, He accumulates at the twin boundaries. The study also shows that the He interstitials evolve into bubbles causing high stress and resulting in a formation of thick prismatic planar defects. Finally, a mechanism is proposed for defect creation and elimination.

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  • Received 12 July 2010

DOI:https://doi.org/10.1103/PhysRevB.83.064104

©2011 American Physical Society

Authors & Affiliations

Avishai Ofan1, Ophir Gaathon1, Lihua Zhang2, Kenneth Evans-Lutterodt2, Sasha Bakhru3, Hassaram Bakhru3, Yimei Zhu2, David Welch2, and Richard M. Osgood, Jr.1

  • 1Center for Integrated Science & Technology, Columbia University, New York, New York 10027, USA
  • 2Brookhaven National Laboratory, Upton, New York 11973, USA
  • 3College of Nanoscale Science and Engineering, State University of New York at Albany, Albany, New York 12222, USA

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Issue

Vol. 83, Iss. 6 — 1 February 2011

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