Step bunching of vicinal 6H-SiC{0001} surfaces

Valery Borovikov and Andrew Zangwill
Phys. Rev. B 79, 245413 – Published 10 June 2009

Abstract

We use kinetic Monte Carlo simulations to understand growth-induced and etching-induced step bunching of 6H-SiC{0001} vicinal surfaces oriented toward 11¯00 and 112¯0. By taking account of the different rates of surface diffusion on three inequivalent terraces, we reproduce the experimentally observed tendency for single bilayer height steps to bunch into half unit-cell height steps. By taking account of the different mobilities of steps with different structures, we reproduce the experimentally observed tendency for adjacent pairs of half unit-cell height steps to bunch into full unit-cell height steps. A prediction of our simulations is that growth-induced and etching-induced step bunching lead to different surface terminations for the exposed terraces when full unit-cell height steps are present.

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  • Received 10 March 2009

DOI:https://doi.org/10.1103/PhysRevB.79.245413

©2009 American Physical Society

Authors & Affiliations

Valery Borovikov* and Andrew Zangwill

  • School of Physics, Georgia Institute of Technology, Atlanta, Georgia 30332, USA

  • *valery.borovikov@physics.gatech.edu
  • andrew.zangwill@physics.gatech.edu

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Issue

Vol. 79, Iss. 24 — 15 June 2009

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