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Stabilization of high-density atomic hydrogen in H2 films at T<0.5K

J. Ahokas, O. Vainio, J. Järvinen, V. V. Khmelenko, D. M. Lee, and S. Vasiliev
Phys. Rev. B 79, 220505(R) – Published 4 June 2009

Abstract

The stabilization of high densities of atomic hydrogen (2×1019cm3) embedded in solid H2 films has been achieved by employing a method for producing the samples involving a direct dissociation of H2 molecules by a cold plasma discharge in the sample cell at temperatures below 0.5 K. High stabilities against recombination were obtained. We observed density-dependent shifts and widths of the electron spin resonance lines resulting from the dipolar interactions between like and unlike spins. We discuss the possibilities for further increasing the H density and studying possible supersolid behavior.

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  • Received 9 April 2009

DOI:https://doi.org/10.1103/PhysRevB.79.220505

©2009 American Physical Society

Authors & Affiliations

J. Ahokas1,*, O. Vainio1, J. Järvinen1,2, V. V. Khmelenko2, D. M. Lee2, and S. Vasiliev1

  • 1Department of Physics and Astronomy, Wihuri Physical Laboratory, University of Turku, 20014 Turku, Finland
  • 2Laboratory of Atomic and Solid State Physics, Cornell University, Ithaca, New York 14850, USA

  • *jmiaho@utu.fi

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Issue

Vol. 79, Iss. 22 — 1 June 2009

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