Growth of Bi thin films on quasicrystal surfaces

H. R. Sharma, V. Fournée, M. Shimoda, A. R. Ross, T. A. Lograsso, P. Gille, and A. P. Tsai
Phys. Rev. B 78, 155416 – Published 14 October 2008

Abstract

We present a comprehensive study of Bi thin-film growth on quasicrystal surfaces. The substrates used for the growth are the fivefold surface of icosahedral (i)-Al-Cu-Fe and i-Al-Pd-Mn and the tenfold surface of decagonal (d)-Al-Ni-Co quasicrystals. The growth is investigated at 300 and 525 K substrate temperatures and at different coverage (θ) ranging from submonolayer to ten monolayers. The film is characterized by scanning tunneling microscopy, reflection high-energy electron diffraction, and x-ray photoelectron spectroscopy. At 300 K, the deposited Bi yields a quasicrystalline film for θ1. For 1<θ<5, it forms nanocrystallites with (100) surface orientation. The islands have magic heights, which correspond to the stacking of four atomic layers (predominantly). The selection of magic heights is interpreted in terms of quantum size effects arising from the electron confinement within the film thickness. The islands establish rotational epitaxial relationship with the substrate. For higher coverage, the film grows with monatomic height, not with magic heights, and reflects the symmetry of the bulk Bi. When deposition is performed at 525 K, terrace diffusion is more effective, resulting in the aggregation of Bi adatoms developing into a smooth monolayer with quasiperiodic order. At this temperature, multilayers do not adsorb.

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  • Received 12 June 2008

DOI:https://doi.org/10.1103/PhysRevB.78.155416

©2008 American Physical Society

Authors & Affiliations

H. R. Sharma1,2,*, V. Fournée3, M. Shimoda1,4, A. R. Ross5, T. A. Lograsso5, P. Gille6, and A. P. Tsai1,4,7

  • 1National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
  • 2Department of Physics and Surface Science Research Centre, The University of Liverpool, Liverpool L69 3BX, United Kingdom
  • 3LSG2M, CNRS-UMR 7584, Ecole des Mines, Parc de Saurupt, 54042 Nancy, France
  • 4SORST, Japan Science and Technology Agency, Japan
  • 5Department of Chemistry, Ames Laboratory, Iowa State University, Ames, Iowa 50011, USA
  • 6Department für Geo- und Umweltwissenschaften, Sektion Kristallographie, Ludwig-Maximilians-Universität München, Theresienstrasse 41, 80333 München, Germany
  • 7Institute of Interdisciplinary Research for Advanced Materials, Tohoku University, Katahira 2-1-1, 980-8577, Japan

  • *Corresponding author. Present address: Department of Physics, The University of Liverpool, Liverpool L69 3BX, UK; h.r.sharma@liv.ac.uk

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Vol. 78, Iss. 15 — 15 October 2008

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