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Origin of the surface metallization in single-domain K/Si(100)2×1

P. Segovia, G. R. Castro, A. Mascaraque, P. Prieto, H. J. Kim, and E. G. Michel
Phys. Rev. B 54, R14277(R) – Published 15 November 1996
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Abstract

The electronic structure and the metallization onset of single-domain K/Si(100)2×1 have been investigated with angle-resolved polarization-sensitive ultraviolet photoemission. The electronic states producing the surface metallization have been studied for increasing K coverages up to room-temperature saturation. As K coverage increases, the interface undergoes a transition at a critical coverage, from a low-coverage semiconducting phase, to a saturation-coverage metallic phase. Two different surface states (F1 and F2) have been detected in the vicinity of the Fermi level. These two states are sequentially filled along the metallization process. The coverage dependence of both F1 and F2, and their symmetry properties indicate that the metallization is due to the filling of an initially empty surface band (appearance of F2). We relate F1 to the completion of K chains in the single-domain surface. The changes detected in K 3p line shape correlate well with the modifications of the valence band, and support that the surface remains semiconducting up to the filling of F2. © 1996 The American Physical Society.

  • Received 12 July 1996

DOI:https://doi.org/10.1103/PhysRevB.54.R14277

©1996 American Physical Society

Authors & Affiliations

P. Segovia, G. R. Castro, A. Mascaraque, P. Prieto, H. J. Kim, and E. G. Michel

  • Departamento de Física de la Materia Condensada and Instituto Universitario de Ciencia de Materiales ``Nicolás Cabrera,'' Universidad Autónoma de Madrid, 28049 Madrid, Spain

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Vol. 54, Iss. 20 — 15 November 1996

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