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Dynamic morphology of the nonequilibrium solid-melt interface in silicon

D. A. Williams, R. A. McMahon, and H. Ahmed
Phys. Rev. B 39, 10467(R) – Published 15 May 1989
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Abstract

It has been found that there is rapid evolution of facetting at the solid-melt interface in silicon during nonequilibrium regrowth and that this facetting can appear to be suppressed under certain oscillatory growth conditions.

  • Received 16 June 1988

DOI:https://doi.org/10.1103/PhysRevB.39.10467

©1989 American Physical Society

Authors & Affiliations

D. A. Williams, R. A. McMahon, and H. Ahmed

  • Microelectronics Research Laboratory, Department of Physics, Cambridge University, Cambridge Science Park, Milton Road, Cambridge CB4 4FW, United Kingdom

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Vol. 39, Iss. 14 — 15 May 1989

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