New phonon threshold phenomenon in electron tunneling

D. C. Tsui
Phys. Rev. B 12, 5853 – Published 15 December 1975
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Abstract

We have observed, in the tunneling characteristics of InAs-oxide-Pb junctions, a structure corresponding to a step decrease in conductance in both bias polarities at the emission threshold for LO phonons in InAs. This unusual phonon structure has been predicted by Appelbaum and Brinkman and by Caroli et al. for electron-phonon interactions confined to an electrode. When the junction conductance is decomposed into an even part GE and an odd part GO, a dip in GO as well as a step decrease in GE are observed at the LO-phonon energy. The dependence of this phonon structure on the electron density, n, in InAs is characterized by the effect of n on ΔGE, the change in GE, and ΔGO, the change in GO at the phonon energy. It is found that, for n varying from 2.1×1016/cm3 to 6.3×1018/cm3, ΔGO remains independent of n and ΔGE decreases with increasing n, following n13.

  • Received 15 May 1975

DOI:https://doi.org/10.1103/PhysRevB.12.5853

©1975 American Physical Society

Authors & Affiliations

D. C. Tsui

  • Bell Laboratories, Murray Hill, New Jersey 07974

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Vol. 12, Iss. 12 — 15 December 1975

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