All-optical photonic switch via the higher-order topological spin Hall effect

Evelyn Y. González-Ramírez, José G. Murillo-Ramírez, Óscar O. Solís-Canto, and José A. Medina-Vázquez
Phys. Rev. Applied 21, 044038 – Published 19 April 2024

Abstract

Topological photonics has established itself as a promising area for the development of photonic integrated circuits due to the robust properties of topological states. In recent years, different logical devices have been proposed to form the fundamental elements of an integrated topological photonic circuit. Despite the rapid theoretical growth of topological photonics, it still lacks experimental foundations concerning logical devices for on-chip integration. For this reason, in this work, we report the design and build of an all-optical photonic switch in a silicon slab working under the higher-order topological spin Hall effect. We have taken advantage of the gapped edge states due to the higher-order topology and combined this feature with changes in the dielectric permittivity of silicon by inducing transitions of free charge carriers. The transitions of charge carriers were realized through the incidence of electromagnetic radiation with a frequency close to the visible-ultraviolet region boundary, making the device operation entirely optical. The behavior of the constructed device has also been numerically simulated and compared with the experimental results obtained. This work contributes to the idea that photonic crystals are a powerful platform for studying topological states and paves the way for the experimental realization of integrated topological optical circuits.

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  • Received 6 December 2023
  • Revised 24 February 2024
  • Accepted 5 April 2024

DOI:https://doi.org/10.1103/PhysRevApplied.21.044038

© 2024 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied PhysicsAtomic, Molecular & Optical

Authors & Affiliations

Evelyn Y. González-Ramírez1,2,*, José G. Murillo-Ramírez1,2, Óscar O. Solís-Canto1, and José A. Medina-Vázquez1,2

  • 1Centro de Investigación en Materiales Avanzados S.C, Complejo Industrial Chihuahua, Miguel de Cervantes 120 C.P. 31136, Chihuahua, Chih., Mexico
  • 2Facultad de Ingeniería, Universidad Autónoma de Chihuahua, Nuevo Campus Universitario, Circuito, Universitario S/N 31125, Chihuahua, Chih., Mexico

  • *Corresponding author: evgonzalez@uach.mx

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Vol. 21, Iss. 4 — April 2024

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