Pressure Heating of Electrons in Capacitively Coupled rf Discharges

M. M. Turner
Phys. Rev. Lett. 75, 1312 – Published 14 August 1995
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Abstract

Collisionless heating in low-pressure capacitively coupled rf discharges is usually attributed to a stochastic interaction between electrons and the oscillating sheath. We show that this explanation is not complete—there is a powerful heating mechanism associated with pressure effects that arise during the expansion and contraction of sheaths.

  • Received 28 March 1995

DOI:https://doi.org/10.1103/PhysRevLett.75.1312

©1995 American Physical Society

Authors & Affiliations

M. M. Turner

  • School of Physical Sciences, Dublin City University, Dublin, Ireland

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Issue

Vol. 75, Iss. 7 — 14 August 1995

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