Abstract
Inelastic light scattering from photoproduced carriers is observed in stressed high-purity silicon at low temperatures. The two electronic Raman structures observed correspond to transitions between stress-split valence bands at the zone center. These transitions can be stress-tuned to the -point phonon energy, thereby exhibiting Fano-type interference between competing scattering amplitudes.
- Received 5 September 1979
DOI:https://doi.org/10.1103/PhysRevLett.43.1950
©1979 American Physical Society