Electrically Tunable Valley Dynamics in Twisted WSe2/WSe2 Bilayers

Giovanni Scuri, Trond I. Andersen, You Zhou, Dominik S. Wild, Jiho Sung, Ryan J. Gelly, Damien Bérubé, Hoseok Heo, Linbo Shao, Andrew Y. Joe, Andrés M. Mier Valdivia, Takashi Taniguchi, Kenji Watanabe, Marko Lončar, Philip Kim, Mikhail D. Lukin, and Hongkun Park
Phys. Rev. Lett. 124, 217403 – Published 28 May 2020
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Abstract

The twist degree of freedom provides a powerful new tool for engineering the electrical and optical properties of van der Waals heterostructures. Here, we show that the twist angle can be used to control the spin-valley properties of transition metal dichalcogenide bilayers by changing the momentum alignment of the valleys in the two layers. Specifically, we observe that the interlayer excitons in twisted WSe2/WSe2 bilayers exhibit a high (>60%) degree of circular polarization (DOCP) and long valley lifetimes (>40ns) at zero electric and magnetic fields. The valley lifetime can be tuned by more than 3 orders of magnitude via electrostatic doping, enabling switching of the DOCP from 80% in the n-doped regime to <5% in the p-doped regime. These results open up new avenues for tunable chiral light-matter interactions, enabling novel device schemes that exploit the valley degree of freedom.

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  • Received 14 December 2019
  • Accepted 6 May 2020

DOI:https://doi.org/10.1103/PhysRevLett.124.217403

© 2020 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Giovanni Scuri1,*, Trond I. Andersen1,*, You Zhou1,2,*, Dominik S. Wild1, Jiho Sung1,2, Ryan J. Gelly1, Damien Bérubé3, Hoseok Heo1,2, Linbo Shao4, Andrew Y. Joe1, Andrés M. Mier Valdivia4, Takashi Taniguchi5, Kenji Watanabe5, Marko Lončar4, Philip Kim1,4, Mikhail D. Lukin1,†, and Hongkun Park1,2,‡

  • 1Department of Physics, Harvard University, Cambridge, Massachusetts 02138, USA
  • 2Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 02138, USA
  • 3Department of Physics, California Institute of Technology, Pasadena, California 91125, USA
  • 4John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA
  • 5National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan

  • *These authors contributed equally to this work.
  • To whom correspondence should be addressed. hongkun_park@harvard.edu,
  • To whom correspondence should be addressed. lukin@physics.harvard.edu

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Vol. 124, Iss. 21 — 29 May 2020

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