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Response of nanocrystalline 3C silicon carbide to heavy-ion irradiation

W. Jiang, H. Wang, I. Kim, I.-T. Bae, G. Li, P. Nachimuthu, Z. Zhu, Y. Zhang, and W. J. Weber
Phys. Rev. B 80, 161301(R) – Published 9 October 2009

Abstract

Nanostructured materials are generally believed to be more radiation resistant. This study reports on Au-ion-induced amorphization in nanocrystalline 3C-SiC, characterized using x-ray diffraction, transmission electron microscopy and Raman spectroscopy. Full amorphization at room temperature occurs at a comparable dose to that for bulk SiC single crystals. The behavior is primarily attributed to a high ion flux and sluggish migration of point defects produced during irradiation. The results may have a significant implication of using nanophased SiC in extremely high radiation environments.

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  • Received 3 August 2009

DOI:https://doi.org/10.1103/PhysRevB.80.161301

©2009 American Physical Society

Authors & Affiliations

W. Jiang1,*, H. Wang2, I. Kim2, I.-T. Bae3, G. Li1, P. Nachimuthu1, Z. Zhu1, Y. Zhang1, and W. J. Weber1

  • 1Pacific Northwest National Laboratory, P.O. Box 999, Richland, Washington 99352, USA
  • 2Texas A&M University, College Station, Texas 77843, USA
  • 3State University of New York at Binghamton, P.O. Box 6000, Binghamton, New York 13902, USA

  • *Corresponding author; weilin.jiang@pnl.gov

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Vol. 80, Iss. 16 — 15 October 2009

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