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Localization length and impurity dielectric susceptibility in the critical regime of the metal-insulator transition in homogeneously doped p-type Ge

Michio Watanabe, Kohei M. Itoh, Youiti Ootuka, and Eugene E. Haller
Phys. Rev. B 62, R2255(R) – Published 15 July 2000
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Abstract

We have determined the localization length ξ and the impurity dielectric susceptibility χimp as a function of Ga acceptor concentrations (N) in nominally uncompensated 70Ge:Ga just below the critical concentration (Nc) for the metal-insulator transition. Both ξ and χimp diverge at Nc according to the functions ξ(1N/Nc)ν and χimp(Nc/N1)ζ, respectively, with ν=1.2±0.3 and ζ=2.3±0.6 for 0.99Nc<N<Nc. Outside of this region (N<0.99Nc), the values of the exponents drop to ν=0.33±0.03 and ζ=0.62±0.05. The effect of the small amount of compensating dopants that are present in our nominally uncompensated samples, may be responsible for the change of the critical exponents at N0.99Nc.

  • Received 10 April 2000

DOI:https://doi.org/10.1103/PhysRevB.62.R2255

©2000 American Physical Society

Authors & Affiliations

Michio Watanabe1, Kohei M. Itoh1,2, Youiti Ootuka3, and Eugene E. Haller4

  • 1Department of Applied Physics and Physico-Informatics, Keio University, Yokohama 223-8522, Japan
  • 2PRESTO-JST, Yokohama 223-8522, Japan
  • 3Institute of Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8571, Japan
  • 4Lawrence Berkeley National Laboratory and University of California at Berkeley, Berkeley, California 94720

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Vol. 62, Iss. 4 — 15 July 2000

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