In situ observation of strain-induced optical anisotropy of ZnSxSe1x/GaAs(110) during molecular-beam epitaxy

Takashi Hanada, Tetsuji Yasuda, Akihiro Ohtake, Kurt Hingerl, Shiro Miwa, Kenta Arai, and Takafumi Yao
Phys. Rev. B 60, 8909 – Published 15 September 1999
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Abstract

In-plane optical anisotropy induced by biaxial strain of pseudomorphic ZnSxSe1x layers grown on GaAs(110) is observed around the band-gap energy by reflectance difference spectroscopy (RDS). The evolution of the strain-induced peaks with increasing film thickness is analyzed by the three-phase (substrate-overlayer-ambient) model. The magnitude and shape of the peaks are, respectively, correlated with the strain and the film thickness. Dielectric-function anisotropies of the pseudomorphic overlayers are obtained using a decomposition method of RD spectra and their imaginary part have a sharp peak at fundamental-gap energy.

  • Received 14 May 1999

DOI:https://doi.org/10.1103/PhysRevB.60.8909

©1999 American Physical Society

Authors & Affiliations

Takashi Hanada

  • Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan;
  • Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-8562, Japan;
  • National Institute for Advanced Interdisciplinary Research (NAIR), Tsukuba 305-8562, Japan

Tetsuji Yasuda

  • Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-8562, Japan
  • National Institute for Advanced Interdisciplinary Research (NAIR), Tsukuba 305-8562, Japan

Akihiro Ohtake

  • Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-8562, Japan
  • Angstrom Technology Partnership (ATP), Tsukuba 305-8562, Japan

Kurt Hingerl

  • Profactor GmbH, Wehrgrabengasse 5, A-4400 Steyr, Austria

Shiro Miwa*

  • Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-8562, Japan
  • Angstrom Technology Partnership (ATP), Tsukuba 305-8562, Japan

Kenta Arai and Takafumi Yao

  • Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan;
  • Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-8562, Japan;
  • National Institute for Advanced Interdisciplinary Research (NAIR), Tsukuba 305-8562, Japan

  • *Present address: Research Center, Sony Corp., Yokohama, 241-0031, Japan.

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Issue

Vol. 60, Iss. 12 — 15 September 1999

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