Thermal structural disorder and melting at a crystalline interface

Tue Nguyen, Paul S. Ho, Thomas Kwok, Cynthia Nitta, and Sidney Yip
Phys. Rev. B 46, 6050 – Published 1 September 1992
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Abstract

Thermal disordering and melting at a grain boundary are investigated by molecular dynamics in an internally consistent simulation model that avoids a number of pitfalls of earlier models. The bulk melting temperature Tm of the model system, specified by an embedded-atom-method potential function fitted to aluminum, is first determined by observing directly surface-nucleated melting in a single-crystal cell with free surfaces. Simulation is then carried out on a bicrystal cell with a high-angle symmetrical tilt grain boundary on the (1¯30) plane. Profiles across the interface of local structural order and energy, along with data on atomic mobility, are obtained at several temperatures from below Tm to above Tm; the results indicate that melting is nucleated at the grain boundary in a similar manner as at the free surface, and that there is no evidence of premelting. In the surface region as well as the grain-boundary core, thermal disordering at temperatures below Tm was observed with characteristic metastable behavior commencing at about 0.93 Tm. The temperature variation of the interfacial thickness suggests that the onset of disordering is a continuous process.

  • Received 12 December 1991

DOI:https://doi.org/10.1103/PhysRevB.46.6050

©1992 American Physical Society

Authors & Affiliations

Tue Nguyen

  • Department of Nuclear Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
  • IBM Burlington, Essex Junction, Vermont 05452

Paul S. Ho and Thomas Kwok

  • IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

Cynthia Nitta

  • Lawrence Livermore Laboratory, Livermore, California 94550

Sidney Yip

  • Department of Nuclear Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

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Vol. 46, Iss. 10 — 1 September 1992

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