Growth and electronic structure of ultrathin palladium films on Al(111) and their interaction with oxygen and carbon monoxide

B. Frick and K. Jacobi
Phys. Rev. B 37, 4408 – Published 15 March 1988
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Abstract

Pd films vapor deposited onto Al(111) were studied by Auger-electron spectroscopy, low-energy electron diffraction (LEED), angle-resolved ultraviolet photoemission spectroscopy, and work-function measurements. At 300 K, Pd grows in the Stranski-Krastanov mode. For thicknesses greater than eight monolayers the Pd film exhibits order which was detected with LEED. The work function shows a minimum at the monolayer coverage and a rise over a transition region of about ten monolayers. The electronic structure of the monolayer was found to be an atomiclike 4d105s0 configuration with the 4d emission centered at 4 eV below EF. This configuration evolved into the bulklike 4d9.65s0.4 one with d states at the Fermi edge for a film thickness above eight monolayers. The adsorption of CO and O2 on Pd monolayers is reversed with respect to the adsorption on bulk Pd: The Pd monolayer reacts strongly with oxygen but only weakly with CO. This is explained by differences in overlap between the Pd 4d and the O 2p and CO 2π* states, respectively.

  • Received 3 November 1987

DOI:https://doi.org/10.1103/PhysRevB.37.4408

©1988 American Physical Society

Authors & Affiliations

B. Frick and K. Jacobi

  • Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-1000 Berlin 33, West Germany

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Issue

Vol. 37, Iss. 9 — 15 March 1988

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