Divacancy production in low-temperature electron-irradiated silicon

C. A. Londos
Phys. Rev. B 35, 7511 – Published 15 May 1987
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Abstract

We report deep-level transient spectroscopy studies on the divacancy formation in electron-bombarded silicon at 80 K. Samples irradiated to a dose D1=3.5×1016 e/cm2 and using a beam current i1=0.33 μA/cm2 give rise to an unstable peak seen to anneal out rapidly below 150 K. The center responsible for this peak seems to act as an intermediate step in the formation of at least a fraction of the neutral divacancies. Under conditions of irradiation with dose D2=1.7×1016 e/cm2 and beam current i2=0.20 μA/cm2 neither the intermediate defect nor the neutral divacancy signal appears in the spectrum. Instead, a divacancy-related EV+0.13 eV level emerged. An interpretation of the data is attempted in terms of a model postulating charge-state-dependent metastable structures.

  • Received 22 December 1986

DOI:https://doi.org/10.1103/PhysRevB.35.7511

©1987 American Physical Society

Authors & Affiliations

C. A. Londos

  • Department of Physics, Solid State Section, University of Athens, 104, Solonos Street, 106 80, Athens, Greece

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Vol. 35, Iss. 14 — 15 May 1987

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