Electronic transport in amorphous Ni1xPx alloys

John P. Carini, Sidney R. Nagel, L. K. Varga, and T. Schmidt
Phys. Rev. B 27, 7589 – Published 15 June 1983
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Abstract

We have measured the resistivity ρ(T) and the thermoelectric power Q(T) in the metallic glass system Ni1xPx, with 0.143x0.243, prepared by chemical deposition and melt quenching. We find that as x increases, ρ increases, α[=(1ρ)dρdT] decreases and becomes negative, and Q increases and becomes positive near x=0.18. These results agree with the Mooij correlation and with a correlation of positive Q with high ρ and negative Q with low ρ, which is also seen in many nonmagnetic metallic glasses. Thus the Ni1xPx system spans the range of behavior seen in many different metallic glasses. For x0.175, ρ(T) and Q(T) are very similar to those seen in iron-based ferromagnetic glasses. The only clear difference between the transport properties of samples prepared by melt quenching and chemical deposition is in the temperature dependence of α. We compare our results with several theories for electron scattering.

  • Received 16 September 1982

DOI:https://doi.org/10.1103/PhysRevB.27.7589

©1983 American Physical Society

Authors & Affiliations

John P. Carini and Sidney R. Nagel

  • The James Franck Institute and the Department of Physics, The University of Chicago, Chicago, Illinois 60637

L. K. Varga* and T. Schmidt

  • Central Research Institute for Physics, P.O. Box 49, 1525-H Budapest, Hungary

  • *On leave from the Institute for Welding and Materials Testing, Timisoara, Romania.

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Vol. 27, Iss. 12 — 15 June 1983

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