Standoff detection of an electric field by bidirectional nitrogen lasing

Xiang Zhang, Qi Lu, Haicheng Mei, Siyu Qin, Yuan Gao, Aurelien Houard, Vladimir Tikhonchuk, Andre Mysyrowicz, Liang Xu, and Yi Liu
Phys. Rev. A 108, 033513 – Published 18 September 2023

Abstract

We report on standoff detection of dc electric field by bidirectional cavity-free lasing emission of neutral nitrogen molecules excited by intense circularly polarized femtosecond laser pulses. We observed that both the backward and forward 337.4 nm coherent lasing emission present a monotonous dependence on the strength of a remotely applied dc field up to 1 kV/cm field strength. Moreover, this method shows a dependence on the polarity of the external dc field, providing a sensitive method for remote characterization of the electric field amplitude and direction. We attribute the underlying mechanism of lasing signal modulation to the electric field induced electron acceleration and deceleration, which results in a variation of the kinetic energy of the free electrons and a modulation of the population inversion responsible for the nitrogen molecules’ lasing. The polarity-sensitive detection anisotropy is interpreted by the symmetry breaking of the electron motion in the plane perpendicular to the laser propagation due to the injection of a weak second harmonic laser field produced in the quarter-wave plate for a circularly polarized pump laser. Numerical simulations based on the two-dimensional time-dependent Schrödinger equation for electron kinetic energy support our interpretation. This study provides a proof-of-principle method for standoff detection of electric fields based on nitrogen lasing, which can be potentially useful for atmospheric and metrological applications.

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  • Received 21 April 2023
  • Revised 11 July 2023
  • Accepted 29 August 2023

DOI:https://doi.org/10.1103/PhysRevA.108.033513

©2023 American Physical Society

Physics Subject Headings (PhySH)

Atomic, Molecular & Optical

Authors & Affiliations

Xiang Zhang1,2, Qi Lu1, Haicheng Mei1, Siyu Qin1, Yuan Gao1, Aurelien Houard2, Vladimir Tikhonchuk3,4, Andre Mysyrowicz2, Liang Xu1,*, and Yi Liu1,5,†

  • 1Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, 516, Jungong Road, 200093 Shanghai, China
  • 2Laboratoire d'Optique Appliquée, ENSTA Paris, CNRS, Ecole Polytechnique, Institut Polytechnique de Paris, 828 Boulevard des Maréchaux, 91762 Palaiseau cedex, France
  • 3Centre Lasers Intenses et Applications, Université de Bordeaux–CNRS–CEA, 351 Cours de la Libération, 33405 Talence cedex, France
  • 4Extreme Light Infrastructure ERIC, ELI-Beamlines Facility, Za Radnicic 835, 25241 Dolní Břežany, Czech Republic
  • 5CAS Center for Excellence in Ultra-intense Laser Science, Shanghai, 201800, China

  • *liangxu2021@usst.edu.cn
  • yi.liu@usst.edu.cn

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Issue

Vol. 108, Iss. 3 — September 2023

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