Large Tunneling Magnetoresistance in GaMnAs /AlAs /GaMnAs Ferromagnetic Semiconductor Tunnel Junctions

M. Tanaka and Y. Higo
Phys. Rev. Lett. 87, 026602 – Published 22 June 2001
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Abstract

We have observed very large tunneling magnetoresistance (TMR) in epitaxially grown Ga1xMnxAs/AlAs/Ga1xMnxAs ferromagnetic semiconductor tunnel junctions. Large TMR ratios more than 70% (maximum 75%) were obtained in junctions with a very thin ( 1.6nm) AlAs tunnel barrier when the magnetic field was applied along the [100] axis in the film plane. The TMR was found to rapidly decrease with increasing barrier thickness, which is explained by calculations assuming that the parallel wave vector of carriers is conserved in tunneling.

  • Received 5 January 2001

DOI:https://doi.org/10.1103/PhysRevLett.87.026602

©2001 American Physical Society

Authors & Affiliations

M. Tanaka and Y. Higo

  • Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

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Issue

Vol. 87, Iss. 2 — 9 July 2001

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