Plasmon slot waveguides: Towards chip-scale propagation with subwavelength-scale localization

J. A. Dionne, L. A. Sweatlock, H. A. Atwater, and A. Polman
Phys. Rev. B 73, 035407 – Published 5 January 2006

Abstract

We present a numerical analysis of surface plasmon waveguides exhibiting both long-range propagation and spatial confinement of light with lateral dimensions of less than 10% of the free-space wavelength. Attention is given to characterizing the dispersion relations, wavelength-dependent propagation, and energy density decay in two-dimensional AgSiO2Ag structures with waveguide thicknesses ranging from 12nmto250nm. As in conventional planar insulator-metal-insulator (IMI) surface plasmon waveguides, analytic dispersion results indicate a splitting of plasmon modes—corresponding to symmetric and antisymmetric electric field distributions—as SiO2 core thickness is decreased below 100nm. However, unlike IMI structures, surface plasmon momentum of the symmetric mode does not always exceed photon momentum, with thicker films (d50nm) achieving effective indices as low as n=0.15. In addition, antisymmetric mode dispersion exhibits a cutoff for films thinner than d=20nm, terminating at least 0.25eV below resonance. From visible to near infrared wavelengths, plasmon propagation exceeds tens of microns with fields confined to within 20nm of the structure. As the SiO2 core thickness is increased, propagation distances also increase with localization remaining constant. Conventional waveguiding modes of the structure are not observed until the core thickness approaches 100nm. At such thicknesses, both transverse magnetic and transverse electric modes can be observed. Interestingly, for nonpropagating modes (i.e., modes where propagation does not exceed the micron scale), considerable field enhancement in the waveguide core is observed, rivaling the intensities reported in resonantly excited metallic nanoparticle waveguides.

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  • Received 9 July 2005

DOI:https://doi.org/10.1103/PhysRevB.73.035407

©2006 American Physical Society

Authors & Affiliations

J. A. Dionne*, L. A. Sweatlock, and H. A. Atwater

  • Thomas J. Watson Laboratories of Applied Physics, California Institute of Technology, MC 128-95, Pasadena, California 91125, USA

A. Polman

  • Thomas J. Watson Laboratories of Applied Physics, California Institute of Technology, MC 128-95, Pasadena, California 91125, USA and The Center for Nanophotonics, FOM-Institute AMOLF, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands

  • *Electronic address: jdionne@caltech.edu

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Vol. 73, Iss. 3 — 15 January 2006

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