Resonant Raman scattering in silicon

J. B. Renucci, R. N. Tyte, and M. Cardona
Phys. Rev. B 11, 3885 – Published 15 May 1975
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Abstract

The resonance of the Raman scattering from the zone-center optical phonon in silicon has been measured over a wide energy range covering the 3.4-eV direct band gap. The experimental results are compared with both a theory deriving the Raman cross section from the optical constants and an ab initio calculation; good agreement is found in the region where the respective theories are expected to be reliable. The second-order Raman spectrum of silicon has also been measured at laser frequencies between 1.65 and 3.72 eV. Above the 3.4-eV gap, we observe a strong peak in the second-order spectrum corresponding to scattering from two optical phonons near the Γ point. From the resonance behavior of the second-order scattering, several electron-two-phonon deformation potentials are determined.

  • Received 9 September 1974

DOI:https://doi.org/10.1103/PhysRevB.11.3885

©1975 American Physical Society

Authors & Affiliations

J. B. Renucci*, R. N. Tyte, and M. Cardona

  • Max-Planck-Institut für Festkörperforschung, Stuttgart, Federal Republic of Germany

  • *On leave from: Laboratoire de Physique Expérimentale, Université Paul Sabatier Toulouse, France.
  • NATO Postdoctoral Fellow. Present address: Royal Aircraft Establishment, Farnborough, United Kingdom.

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Vol. 11, Iss. 10 — 15 May 1975

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