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Symmetry-dependent phonon renormalization in monolayer MoS2 transistor

Biswanath Chakraborty, Achintya Bera, D. V. S. Muthu, Somnath Bhowmick, U. V. Waghmare, and A. K. Sood
Phys. Rev. B 85, 161403(R) – Published 6 April 2012

Abstract

A strong electron-phonon interaction which limits the electronic mobility of semiconductors can also have significant effects on phonon frequencies. The latter is the key to the use of Raman spectroscopy for nondestructive characterization of doping in graphene-based devices. Using in situ Raman scattering from a single-layer MoS2 electrochemically top-gated field-effect transistor (FET), we show softening and broadening of the A1g phonon with electron doping, whereas the other Raman-active E2g1 mode remains essentially inert. Confirming these results with first-principles density functional theory based calculations, we use group theoretical arguments to explain why the A1g mode specifically exhibits a strong sensitivity to electron doping. Our work opens up the use of Raman spectroscopy in probing the level of doping in single-layer MoS2-based FETs, which have a high on-off ratio and are of technological significance.

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  • Received 17 December 2011

DOI:https://doi.org/10.1103/PhysRevB.85.161403

©2012 American Physical Society

Authors & Affiliations

Biswanath Chakraborty1, Achintya Bera1, D. V. S. Muthu1, Somnath Bhowmick2, U. V. Waghmare2, and A. K. Sood1,*

  • 1Department of Physics, Indian Institute of Science, Bangalore-560012, India
  • 2Theoretical Sciences Unit, Jawaharlal Nehru Centre for Advanced Scientific Research, Bangalore-560064, India

  • *Corresponding author: asood@physics.iisc.ernet.in

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Vol. 85, Iss. 16 — 15 April 2012

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