Effect of Interfacial Shallow Traps on Polaron Transport at the Surface of Organic Semiconductors

M. F. Calhoun, C. Hsieh, and V. Podzorov
Phys. Rev. Lett. 98, 096402 – Published 28 February 2007

Abstract

The photo-induced electron and hole transfer across the semiconductor-dielectric interface in trap-dominated p-type organic field-effect transistors has been investigated. It has been observed that the transfer of electrons into the dielectric results in a decrease of the field-effect mobility of polarons, suggesting that additional shallow traps are generated in the conduction channel. Using this effect, the dependence of the field-effect mobility on the density of shallow traps, μ(N), has been measured, which allowed us to estimate the average polaron trapping time, τtr=50±10ps, and the density of shallow traps, N0=(3±0.5)×1011cm2, in the channel of single-crystal tetracene devices.

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  • Received 29 September 2006

DOI:https://doi.org/10.1103/PhysRevLett.98.096402

©2007 American Physical Society

Authors & Affiliations

M. F. Calhoun, C. Hsieh, and V. Podzorov*

  • Department of Physics and Astronomy, Rutgers University, Piscataway, New Jersey, USA

  • *Electronic mail: podzorov@physics.rutgers.edu

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Issue

Vol. 98, Iss. 9 — 2 March 2007

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