Using light as a lens for submicron, neutral-atom lithography

G. Timp, R. E. Behringer, D. M. Tennant, J. E. Cunningham, M. Prentiss, and K. K. Berggren
Phys. Rev. Lett. 69, 1636 – Published 14 September 1992
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Abstract

We show that light can be used as a lens to focus a collimated neutral atomic beam to submicron dimensions during deposition onto a substrate. We have used an optical standing wave at 589 nm as an array of cylindrical lenses to focus a perpendicular sodium beam into a grating on a substrate, with a periodicity of 294.3±0.3 nm. This result is the first direct evidence of submicron focusing of atoms by light, and represents a fundamentally new scheme for submicron lithography.

  • Received 27 February 1992

DOI:https://doi.org/10.1103/PhysRevLett.69.1636

©1992 American Physical Society

Authors & Affiliations

G. Timp, R. E. Behringer, D. M. Tennant, and J. E. Cunningham

  • AT&T Bell Laboratories, Holmdel, New Jersey 07733

M. Prentiss and K. K. Berggren

  • Harvard University, Cambridge, Massachusetts 02138

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Vol. 69, Iss. 11 — 14 September 1992

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