Observation of strain-enhanced electron-spin polarization in photoemission from InGaAs

T. Maruyama, E. L. Garwin, R. Prepost, G. H. Zapalac, J. S. Smith, and J. D. Walker
Phys. Rev. Lett. 66, 2376 – Published 6 May 1991
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Abstract

Electron-spin polarization in excess of 70% has been observed in photoemission from a 0.1-μm-thick epitaxial layer of InxGa1xAs with x≊0.13 grown on a GaAs substrate. Under these conditions, the epitaxial layer is expected to be highly strained by the 0.9% lattice mismatch. The electron polarization and the quantum efficiency have been measured as a function of the excitation photon energy from 1.25 to 2.0 eV. A significant enhancement of the electron polarization occurs in the vicinity of 1.33 eV where the expected strain-induced level splitting permits optical excitation of a single-band transition.

  • Received 26 February 1991

DOI:https://doi.org/10.1103/PhysRevLett.66.2376

©1991 American Physical Society

Authors & Affiliations

T. Maruyama and E. L. Garwin

  • Stanford Linear Accelerator Center, Stanford University, Stanford, California 94309

R. Prepost and G. H. Zapalac

  • Department of Physics, University of Wisconsin, Madison, Wisconsin 53706

J. S. Smith and J. D. Walker

  • Department of Electrical Engineering and Computer Sciences and The Electronics Research Laboratory, University of California, Berkeley, Berkeley, California 94720

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Vol. 66, Iss. 18 — 6 May 1991

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