Avalanche in adhesion

John R. Smith; Guillermo Bozzolo; Amitava Banerjea; John Ferrante

doi:10.1103/PhysRevLett.63.1269

Avalanche in adhesion

John R. Smith, Guillermo Bozzolo, Amitava Banerjea, and John Ferrante

Phys. Rev. Lett. 63, 1269 – Published 18 September 1989

Abstract

Consider surfaces being brought into contact. It is proposed that atomic layers can collapse or avalanche together when the interfacial spacing falls below a critical distance. This causes a discontinuous drop in the adhesive binding energy. Avalanche can occur regardless of the stiffness of external supports. A simple understanding of the origin of this phenomenon is provided. A numerical calculation has been carried out for adhesion in Ni. A new wear mechanism due to avalanche is suggested.

Received 30 May 1989

DOI:https://doi.org/10.1103/PhysRevLett.63.1269

Authors & Affiliations

John R. Smith, Guillermo Bozzolo, Amitava Banerjea, and John Ferrante

Department of Physics, General Motors Research Laboratories, Warren Michigan 48090-9055
Department of Physics, Case Western Reserve University, Cleveland, Ohio 44106
Department of Physics, Kent State University, Kent, Ohio 44242
National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135