Resonance Spectroscopy of Electronic Levels in a Surface Accumulation Layer

A. Kamgar, P. Kneschaurek, G. Dorda, and J. F. Koch
Phys. Rev. Lett. 32, 1251 – Published 3 June 1974
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Abstract

Resonance transitions are observed between electronic levels in an accumulation layer on n-type (100)Si. Signals are studied at the 220-, 171-, and 118-μm lines of a watervapor (H2O, D2O) molecular laser. Strong transitions from the lowest two-dimensional sub-band to the next higher band are observed. For 118-μm radiation the resonance occurs at about 0.6 × 1012 electrons/cm2.

  • Received 25 March 1974

DOI:https://doi.org/10.1103/PhysRevLett.32.1251

©1974 American Physical Society

Authors & Affiliations

A. Kamgar, P. Kneschaurek, G. Dorda*, and J. F. Koch

  • Physik-Department, Technische Universität München, 8046 Garching, West Germany

  • *Permanent address: Forschungslaboratorien der Siemens AG, München, West Germany.

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Vol. 32, Iss. 22 — 3 June 1974

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