Abstract
An intriguing property of a three-dimensional (3D) topological insulator (TI) is the existence of surface states with spin-momentum locking, which offers a new frontier of exploration in spintronics. Here, we report the observation of a new type of Hall effect in a 3D TI film. The Hall resistance scales linearly with both the applied electric and magnetic fields and exhibits a angle offset with respect to its longitudinal counterpart, in contrast to the usual angle offset of between the linear planar Hall effect and the anisotropic magnetoresistance. This novel nonlinear planar Hall effect originates from the conversion of a nonlinear transverse spin current to a charge current due to the concerted actions of spin-momentum locking and time-reversal symmetry breaking, which also exists in a wide class of noncentrosymmetric materials with a large span of magnitude. It provides a new way to characterize and utilize the nonlinear spin-to-charge conversion in a variety of topological quantum materials.
- Received 12 December 2018
- Revised 7 May 2019
DOI:https://doi.org/10.1103/PhysRevLett.123.016801
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