Roughness Induced Backscattering in Optical Silicon Waveguides

Francesco Morichetti, Antonio Canciamilla, Carlo Ferrari, Matteo Torregiani, Andrea Melloni, and Mario Martinelli
Phys. Rev. Lett. 104, 033902 – Published 20 January 2010

Abstract

We report on the direct observation of backscattering induced by sidewall roughness in high-index-contrast optical waveguides based on total internal reflection. Our results demonstrate that backscattering is one of the most severe limiting factors in state-of-the art silicon on insulator nanowires employed in densely integrated photonics. We also derive the general relationship between backscattering and geometrical and optical parameters of the waveguide. Further, the role of roughness in polarization rotation and coupling with higher-order modes is pointed out.

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  • Received 29 June 2009

DOI:https://doi.org/10.1103/PhysRevLett.104.033902

©2010 American Physical Society

Authors & Affiliations

Francesco Morichetti*

  • Policom—DEI, Politecnico di Milano, Via Colombo 81, 20133 Milano, Italy and Fondazione Politecnico di Milano, Via Garofalo 39, Milano 20133, Italy

Antonio Canciamilla, Carlo Ferrari, Matteo Torregiani, Andrea Melloni, and Mario Martinelli

  • Policom—DEI, Politecnico di Milano, Via Colombo 81, 20133 Milano, Italy

  • *morichetti@elet.polimi.it

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Vol. 104, Iss. 3 — 22 January 2010

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