Absorption and hot electron production by high intensity femtosecond uv-laser pulses in solid targets

U. Teubner, I. Uschmann, P. Gibbon, D. Altenbernd, E. Förster, T. Feurer, W. Theobald, R. Sauerbrey, G. Hirst, M. H. Key, J. Lister, and D. Neely
Phys. Rev. E 54, 4167 – Published 1 October 1996
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Abstract

The interaction of femtosecond KrF*-laser pulses with plasmas of various solid target materials has been studied up to intensities exceeding 1018 W/cm2. Absorption measurements were performed for p- ands-polarized laser light and as a function of the laser intensity and the angle of incidence. They reveal substantial absorption up to 70% even at intensities in excess of 1018W/cm2. The results have also been compared to simulations of the absorption at high intensities and, in particular, the peaking of the absorption for large angles of incidence (70°–80°) appears to be consistent with the anomalous skin effect as an important contribution to the total laser pulse absorption. X-ray spectra were measured in the keV range (i.e., between 6.5 and 8.4 Å) and in the soft-x-ray region (i.e., between 25 and 400 Å). The electron density and temperature of the plasma has been estimated by comparison of the experimental spectra with spectral simulations. A systematic study of the hot electrons produced by 248-nm light is presented. Targets consisting of an Al layer on a Si substrate have been used to determine the hot electron yield and the corresponding energy. The K-α line emission produced by the hot electrons has been observed as a function of the Al-layer thickness. The measurements have been compared to simulations. The estimated hot electron temperature ∼8 keV is considerably lower than that deduced from experiments using lasers of longer wavelength and comparable intensities. Scaling indicates that 0.25-μm lasers can simultaneously fulfill the requirements for both intensity and hot electron temperature for the ‘‘fast ignitor.’’ © 1996 The American Physical Society.

  • Received 6 June 1996

DOI:https://doi.org/10.1103/PhysRevE.54.4167

©1996 American Physical Society

Authors & Affiliations

U. Teubner, I. Uschmann, P. Gibbon, D. Altenbernd, and E. Förster

  • Max-Planck-Arbeitsgruppe ‘‘Röntgenoptik’’ an der Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany

T. Feurer, W. Theobald, and R. Sauerbrey

  • Institut für Optik und Quantenelektronik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany

G. Hirst, M. H. Key, J. Lister, and D. Neely

  • Rutherford Appleton Laboratory, Chilton, Didcot, Oxon, OX11 0QX, Great Britain

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Vol. 54, Iss. 4 — October 1996

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