Abstract
By combining high-resolution transmission electron microscopy experiments and first-principles calculations, we study production, diffusion, and agglomeration of sulfur vacancies in monolayer MoS under electron irradiation. Single vacancies are found to be mobile under the electron beam and tend to agglomerate into lines. Different kinds of such extended defects are identified in the experiments, and their atomic structures and electronic properties are determined with the help of calculations. The orientation of line defects is found to be sensitive to mechanical strain. Our calculations also indicate that the electronic properties of the extended defects can be tuned by filling vacancy lines with other atomic species, thereby suggesting a way for strain and electron-beam-assisted engineering of MoS-based nanostructures.
- Received 12 April 2013
DOI:https://doi.org/10.1103/PhysRevB.88.035301
©2013 American Physical Society