Lattice location study of ion implanted Sn and Sn-related defects in Ge

S. Decoster, S. Cottenier, U. Wahl, J. G. Correia, and A. Vantomme
Phys. Rev. B 81, 155204 – Published 14 April 2010

Abstract

In this work, we present a lattice location study of Sn in Ge. From emission channeling experiments, we determined the exact lattice location of ion implanted S121n atoms and compared the results to predictions from density-functional calculations. The majority of the Sn atoms are positioned on the substitutional site, as can be expected for an isovalent impurity, while a second significant fraction occupies the sixfold coordinated bond-centered site, which is stable up to at least 400°C. Corroborated by ab initio calculations, we attribute this fraction of bond-centered Sn atoms to the Sn-vacancy defect complex in the split-vacancy configuration. Furthermore, we are able to assign specific defect complex geometries to resonances from earlier Mössbauer spectroscopy studies of Sn in Ge.

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  • Received 13 January 2010

DOI:https://doi.org/10.1103/PhysRevB.81.155204

©2010 American Physical Society

Authors & Affiliations

S. Decoster1,*, S. Cottenier2, U. Wahl3, J. G. Correia3, and A. Vantomme1

  • 1Instituut voor Kern- en Stralingsfysica and INPAC, K.U.Leuven, 3001 Leuven, Belgium
  • 2Center for Molecular Modeling, Ghent University, Technologiepark 903, 9052 Zwijnaarde, Belgium
  • 3Instituto Tecnológico e Nuclear, Unidade de Física e Aceleradores, Estrada Nacional 10, Apt. 21, 2686-953 Sacavém, Portugal

  • *stefan.decoster@fys.kuleuven.be

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Vol. 81, Iss. 15 — 15 April 2010

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