Dislocation Mobility in Pure Copper at 4.2 °K

K. M. Jassby and T. Vreeland, Jr.
Phys. Rev. B 8, 3537 – Published 15 October 1973
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Abstract

Torsional stress pulses of several microseconds duration were applied at 4.2 °K to cylindrical single crystals of copper containing freshly introduced dislocations. Dislocation displacements were measured by means of a double-etch technique, and subsequently the dislocation damping coefficient B was determined to be equal to 0.8 × 105 dyn sec/cm2. While B decreases monotonically with decreasing temperature, the value of B at 4.2 °K is greater than that predicted from theoretical calculations of the interaction between a moving dislocation and the conduction-electron gas in copper.

  • Received 14 February 1972

DOI:https://doi.org/10.1103/PhysRevB.8.3537

©1973 American Physical Society

Authors & Affiliations

K. M. Jassby* and T. Vreeland, Jr.

  • W. M. Keck Laboratory of Engineering Materials, California Institute of Technology, Pasadena, California 91109

  • *Present address: School of Engineering, Tel Aviv University, Ramat Aviv, Tel Aviv, Israel.

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Issue

Vol. 8, Iss. 8 — 15 October 1973

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