Diffraction refinement of localized antibonding at the Si(111) 7×7 surface

J. Ciston, A. Subramanian, I. K. Robinson, and L. D. Marks
Phys. Rev. B 79, 193302 – Published 6 May 2009
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Abstract

We report an experimental refinement of the local charge density at the Si(111) 7×7 surface using a combination of x-ray and high-energy electron diffraction. This method can be generally applied to the charge-density refinement at surfaces of other materials. By perturbing about a bond-centered pseudoatom model, we find experimentally that the adatom electrons occupy antibonding-like backbond states with the atoms below. We are also able to refine a charge transfer of 0.26±0.04e from each adatom to the underlying layers, in agreement with full-potential density-functional theory calculations.

  • Figure
  • Received 30 December 2008

DOI:https://doi.org/10.1103/PhysRevB.79.193302

©2009 American Physical Society

Authors & Affiliations

J. Ciston1, A. Subramanian1, I. K. Robinson2, and L. D. Marks1

  • 1Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA
  • 2Department of Physics and Astronomy and London Centre for Nanotechnology, University College London, London WC1H 0AH, United Kingdom

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Issue

Vol. 79, Iss. 19 — 15 May 2009

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