Magnetism in C60 films induced by proton irradiation

S. Mathew, B. Satpati, B. Joseph, B. N. Dev, R. Nirmala, S. K. Malik, and R. Kesavamoorthy
Phys. Rev. B 75, 075426 – Published 27 February 2007

Abstract

It is shown that polycrystalline fullerene thin films on hydrogen-passivated Si(111) substrates irradiated by 2MeV protons display ferromagneticlike behavior at 5K. At 300K, both the pristine and the irradiated film show diamagnetic behavior. Magnetization data in the temperature range of 2300K in 1T applied field, for the irradiated film show much stronger temperature dependence compared to the pristine film. Possible origins of ferromagneticlike signals in the irradiated films are discussed.

  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Received 3 June 2006

DOI:https://doi.org/10.1103/PhysRevB.75.075426

©2007 American Physical Society

Authors & Affiliations

S. Mathew, B. Satpati, and B. Joseph

  • Institute of Physics, Sachivalaya Marg, Bhubaneswar 751 005, India

B. N. Dev*

  • Institute of Physics, Sachivalaya Marg, Bhubaneswar 751 005, India and Indian Association for the Cultivation of Science, 2A & 2B Raja S.C. Mullick Road, Jadavpur, Kolokata 700 032, India

R. Nirmala and S. K. Malik

  • Tata Institute of Fundamental Research, Mumbai 400 005, India

R. Kesavamoorthy

  • Materials Science Division, Indira Gandhi Centre for Atomic Research, Kalpakkam 603 102, India

  • *Electronic address: bhupen@iopb.res.in; msbnd@iacs.res.in
  • Present address: International Center for Condensed Matter Physics (ICCMP), University of Brasilia, 70904–970 Brasilia DF, Brazil.

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 75, Iss. 7 — 15 February 2007

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×