In vacuo photoemission study of atomically controlled La1xSrxMnO3 thin films: Composition dependence of the electronic structure

K. Horiba, A. Chikamatsu, H. Kumigashira, M. Oshima, N. Nakagawa, M. Lippmaa, K. Ono, M. Kawasaki, and H. Koinuma
Phys. Rev. B 71, 155420 – Published 27 April 2005

Abstract

We have investigated change in the electronic structures of atomically controlled La1xSrxMnO3 (LSMO) thin films as a function of hole-doping levels (x) in terms of in vacuo photoemission spectroscopy (PES) and x-ray absorption spectroscopy (XAS) measurements. The in vacuo PES measurements on a well-ordered surface of high-quality epitaxial LSMO thin films enable us to reveal their intrinsic electronic structures, especially the structure near the Fermi level (EF). We found that overall the features of the valence band as well as the core levels monotonically shifted toward lower binding energy as x was increased, indicating the systematic chemical-potential shift of LSMO thin films with hole doping. The peak nearest to EF due to the eg orbital is also found to move toward EF, while the peak intensity decreases with increasing x. The loss of spectral weight with x in the occupied density of states was compensated by the simultaneous increment of the shoulder structure in O 1s XAS spectra, suggesting the existence of a pseudogap, that is, a lowering in spectral weight at EF, for all metallic compositions. These results indicate that the simple rigid-band model does not describe the electronic structure near EF of LSMO, and that the spectral weight transfer from below to above EF across the gap dominates the spectral changes with x in LSMO thin films.

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  • Received 11 June 2004

DOI:https://doi.org/10.1103/PhysRevB.71.155420

©2005 American Physical Society

Authors & Affiliations

K. Horiba*, A. Chikamatsu, H. Kumigashira, and M. Oshima

  • Department of Applied Chemistry, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

N. Nakagawa and M. Lippmaa

  • Institute for Solid State Physics, The University of Tokyo, Kashiwa 277-8581, Japan

K. Ono

  • Institute of Materials Structure Science, High Energy Accelerator Research Organization (KEK), 1-1 Oho, Tsukuba 305-0801, Japan

M. Kawasaki

  • Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan

H. Koinuma

  • Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan

  • *Present address: RIKEN/SPring-8, 1-1-1 Kouto, Mikazuki-cho, Sayo-gun, Hyogo 679-5148, Japan.
  • Author to whom correspondence should be addressed. Electronic address: kumigashira@sr.t.u-tokyo.ac.jp
  • Also at Combinatorial Materials Exploration and Technology (COMET), Tsukuba 305-0044, Japan.

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Issue

Vol. 71, Iss. 15 — 15 April 2005

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