High-resolution resonance photoemission study of CeMX (M=Pt,Pd;X=P,As,Sb)

T. Iwasaki, A. Sekiyama, A. Yamasaki, M. Okazaki, K. Kadono, H. Utsunomiya, S. Imada, Y. Saitoh, T. Muro, T. Matsushita, H. Harima, S. Yoshii, M. Kasaya, A. Ochiai, T. Oguchi, K. Katoh, Y. Niide, K. Takegahara, and S. Suga
Phys. Rev. B 65, 195109 – Published 23 April 2002
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Abstract

We have performed high-resolution Ce 3d4f resonance photoemission (RPES) measurements for low Kondo temperature (TK) CeMX (M=Pd,Pt,X=P,As,Sb) and compared the results with 4d4f RPES. The experimental results reveal that the bulk Ce 4f electronic structures are remarkably different from those in the surface layer even in low-TK materials. The non-4f valence-band spectra are well described by the results of the band-structure calculation of isostructural LaMX by considering the photoionization cross sections. We have analyzed the Ce 4f spectra by using a noncrossing approximation calculation based on the single-impurity Anderson model. The calculated results successfully reproduce the experimental 4f spectra. We find that the bare 4f level shift is the most important factor in explaining the difference between the surface and bulk Ce 4f spectra. Moreover, the Ce 4f states of CeMX are found to hybridize preferentially with a particular part of the p-d mixed antibonding states.

  • Received 22 March 2001

DOI:https://doi.org/10.1103/PhysRevB.65.195109

©2002 American Physical Society

Authors & Affiliations

T. Iwasaki, A. Sekiyama, A. Yamasaki, M. Okazaki, K. Kadono, H. Utsunomiya, and S. Imada

  • Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan

Y. Saitoh

  • Japan Atomic Energy Research Institute, SPring-8, Mikazuki, Hyogo 679-5148, Japan

T. Muro and T. Matsushita

  • Japan Synchrotron Radiation Research Institute, SPring-8, Mikazuki, Hyogo 679-5198, Japan

H. Harima

  • The Institute of Scientific and Industrial Research, Osaka University, Ibaraki 567-0047, Japan

S. Yoshii* and M. Kasaya

  • Department of Physics, Tohoku University, Sendai 980-8578, Japan

A. Ochiai

  • Center for Low Temperature Science, Tohoku University, Sendai 980-8578, Japan

T. Oguchi

  • Department of Physics, Hiroshima University, Higashi-Hiroshima 739-8526, Japan

K. Katoh and Y. Niide

  • School of Applied Sciences, National Defense Academy, Yokosuka 239-8686, Japan

K. Takegahara

  • Department of Materials Science and Technology, Hirosaki University, Hirosaki 036-8561, Japan

S. Suga

  • Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan

  • *Present address: Department of Physics, Nagoya University, Nagoya 464-8602, Japan.

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Issue

Vol. 65, Iss. 19 — 15 May 2002

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