Nature of impurity states in doped amorphous silicon

G. Allan, C. Delerue, and M. Lannoo
Phys. Rev. B 61, 10206 – Published 15 April 2000
PDFExport Citation

Abstract

We calculate the electronic structure of doped amorphous silicon in a tight-binding framework. Substitutional impurities are randomly introduced at fourfold-coordinated sites of a previously published model of a-Si:H. Our most important result is that single impurities have much larger binding energies than those in the bulk crystal so that their spectral distribution gives an important contribution to the Urbach tails. We analyze the origin of this situation and present an original physical interpretation in terms of an impurity-induced shift of the localized states characterizing the undoped material. Finally we compare our predictions to experimental data and discuss the effect of long-range potential fluctuations.

  • Received 28 September 1999

DOI:https://doi.org/10.1103/PhysRevB.61.10206

©2000 American Physical Society

Authors & Affiliations

G. Allan, C. Delerue, and M. Lannoo

  • Institut d’Electronique et de Microélectronique du Nord-Département Institut Supérieur d’Électronique du Nord, Boîte Postale 69, 59652 Villeneuve d’Ascq Cedex, France

References (Subscription Required)

Click to Expand
Issue

Vol. 61, Iss. 15 — 15 April 2000

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×