Electronic properties of isostructural ruthenium and osmium silicides and germanides

A. B. Filonov, D. B. Migas, V. L. Shaposhnikov, N. N. Dorozhkin, V. E. Borisenko, A. Heinrich, and H. Lange
Phys. Rev. B 60, 16494 – Published 15 December 1999
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Abstract

Electronic band structure calculations of Nowotny “chimney-ladder” isostructural ruthenium and osmium silicides and related germanides have been performed by the linear muffin-tin orbital method within the local density approximation. Both silicides have been found to be direct gap semiconductors with energy gaps of 0.41 and 0.95 eV in Ru2Si3 and Os2Si3, while the band gaps in the germanides have a competitive indirect-direct character with gaps of about 0.3 and 0.9 eV in Ru2Ge3 and Os2Ge3, respectively.

  • Received 4 June 1999

DOI:https://doi.org/10.1103/PhysRevB.60.16494

©1999 American Physical Society

Authors & Affiliations

A. B. Filonov, D. B. Migas, V. L. Shaposhnikov, N. N. Dorozhkin, and V. E. Borisenko

  • Belarusian State University of Informatics and Radioelectronics, P. Browka 6, 220027 Minsk, Belarus

A. Heinrich

  • Institute of Solid State and Materials Research Dresden, Helmholtz Strasse 20, D-01069 Dresden, Germany

H. Lange

  • Hahn Meitner Institute, Department Photovoltaics, Rudower Chaussee, D-12489 Berlin, Germany

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Issue

Vol. 60, Iss. 24 — 15 December 1999

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