Electron correlation, metallization, and Fermi-level pinning at ultrathin K/Si(111) interfaces

H. H. Weitering, J. Chen, N. J. DiNardo, and E. W. Plummer
Phys. Rev. B 48, 8119 – Published 15 September 1993
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Abstract

In this paper we present a detailed photoemission study of the K/Si(111)7×7 and K/Si(111)(√3 × √3 )R30°-B interfaces. Angle-resolved valence-band spectroscopy reveals the presence of an almost dispersionless interface state below EF. Both interfaces are clearly nonmetallic at room-temperature saturation coverage. We critically address the issues of charge transfer and Fermi-level pinning by a detailed analysis of the K 3p and Si 2p core-level spectra. We conclude that, up to saturation coverage, correlation effects determine the electronic properties of these interfaces. Metallization occurs during the development of the second layer at cryogenic temperatures.

  • Received 31 March 1993

DOI:https://doi.org/10.1103/PhysRevB.48.8119

©1993 American Physical Society

Authors & Affiliations

H. H. Weitering and J. Chen

  • Department of Physics, University of Pennsylvania, Philadelphia, Pennsylvania 19104

N. J. DiNardo

  • Department of Physics and Atmospheric Science, Drexel University, Philadelphia, Pennsylvania 19104

E. W. Plummer

  • Department of Physics and Astronomy, University of Tennessee, Knoxville, Tennessee 37996
  • Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831

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Vol. 48, Iss. 11 — 15 September 1993

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