Semimetal-to-semiconductor transition in bismuth thin films

C. A. Hoffman, J. R. Meyer, F. J. Bartoli, A. Di Venere, X. J. Yi, C. L. Hou, H. C. Wang, J. B. Ketterson, and G. K. Wong
Phys. Rev. B 48, 11431 – Published 15 October 1993
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Abstract

Field- and temperature-dependent magnetotransport measurements on Bi layers grown by molecular-beam epitaxy have been analyzed by mixed-conduction techniques. In the thin-film limit, the net hole density scales inversely with layer thickness while the mobility scales linearly. By studying the minority electron concentration as a function of temperature in the range 100–300 K, we have unambiguously confirmed the long-standing theoretical prediction that quantum confinement should convert Bi from a semimetal to a semiconductor at a critical thickness on the order of 300 Å.

  • Received 17 June 1993

DOI:https://doi.org/10.1103/PhysRevB.48.11431

©1993 American Physical Society

Authors & Affiliations

C. A. Hoffman, J. R. Meyer, and F. J. Bartoli

  • Code 5613, Naval Research Laboratory, Washington, D.C. 20375-5320

A. Di Venere, X. J. Yi, C. L. Hou, H. C. Wang, J. B. Ketterson, and G. K. Wong

  • Department of Physics and Astronomy, Northwestern University, Evanston, Illinois 60208

Comments & Replies

Reply to ‘‘Comment on ‘Semimetal-to-semiconductor transition in bismuth thin films’ ’’

C. A. Hoffman, J. R. Meyer, F. J. Bartoli, A. Di Venere, X. J. Yi, C. L. Hou, H. C. Wang, J. B. Ketterson, and G. K. Wong
Phys. Rev. B 51, 5535 (1995)

Comment on ‘‘Semimetal-to-semiconductor transition in bismuth thin films’’

H. T. Chu
Phys. Rev. B 51, 5532 (1995)

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Vol. 48, Iss. 15 — 15 October 1993

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