Temperature dependence of the magnetic susceptibility of a CrSi2 single crystal

Isao J. Ohsugi, Tsutomu Kojima, and Isao A. Nishida
Phys. Rev. B 42, 10761 – Published 1 December 1990
PDFExport Citation

Abstract

A single crystal of CrSi2 was grown by a modified floating-zone refining technique, and its magnetic susceptibilities and Hall coefficients in the directions of both the a and c axes were measured over a temperature range from room temperature to 1000 K. The susceptibilities were constantly negative over the temperature range and possessed a minimum value at 770 K. The temperature dependence of the hole concentration estimated from observed data of the Hall measurement suggested that above 770 K the susceptibility is primarily dominated by the contribution from charge carriers. The chemical composition of the crystal was estimated at CrSi1.985 by quantitative chemical analysis. A theoretical curve of susceptibility was calculated by assuming that the excess Cr atoms act as Cr3+ ions in the crystal. The observed susceptibilities were in good agreement with the theoretical curve. It was concluded that the Cr atoms constituting a stoichiometric CrSi2 lattice are quadrivalent by reason of their negligibly small contribution to the susceptibility.

  • Received 2 July 1990

DOI:https://doi.org/10.1103/PhysRevB.42.10761

©1990 American Physical Society

Authors & Affiliations

Isao J. Ohsugi

  • Physics Laboratory, Salesian Polytechnic, Suginami-ku, Tokyo 167, Japan

Tsutomu Kojima

  • Electric Engineering Department, Salesian Polytechnic, Suginami-ku, Tokyo 167, Japan

Isao A. Nishida

  • National Research Institute for Metals, Meuro-ku, Tokyo 153, Japan

References (Subscription Required)

Click to Expand
Issue

Vol. 42, Iss. 16 — 1 December 1990

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×