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Characterization of microvoids in device-quality hydrogenated amorphous silicon by small-angle x-ray scattering and infrared measurements

A. H. Mahan, D. L. Williamson, B. P. Nelson, and R. S. Crandall
Phys. Rev. B 40, 12024(R) – Published 15 December 1989
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Abstract

The size, shape, and number density of microvoids in device-quality glow discharge deposited hydrogenated a-Si has been obtained by small-angle x-ray scattering (SAXS). By combining the SAXS results with infrared measurements, we deduce that the interior surfaces of these microvoids are largely unhydrogenated, containing at most 49 bonded H atoms. We suggest that these H atoms are the clustered H atoms previously detected by multiple-quantum NMR.

  • Received 31 July 1989

DOI:https://doi.org/10.1103/PhysRevB.40.12024

©1989 American Physical Society

Authors & Affiliations

A. H. Mahan

  • Solar Energy Research Institute, 1617 Cole Boulevard, Golden, Colorado 80401

D. L. Williamson

  • Physics Department, Colorado School of Mines, Golden, Colorado 80401

B. P. Nelson and R. S. Crandall

  • Solar Energy Research Institute, 1617 Cole Boulevard, Golden, Colorado 80401

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Vol. 40, Iss. 17 — 15 December 1989

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