Temperature dependence of the direct gap of Si and Ge

P. B. Allen and M. Cardona
Phys. Rev. B 27, 4760 – Published 15 April 1983
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Abstract

The temperature dependences of the lowest direct gaps of germanium and silicon are calculated. They result from the effect of electron-phonon interaction on the corresponding electronic states. Both Debye-Waller (second-order interaction Hamiltonian) and "self-energy" (first-order interaction Hamiltonian) are included. It is shown that the latter are by no means negligible. They reduce the calculated temperature coefficients at constant volume by a factor of 1.7 in the case of Si and 1.3 in the case of Ge. Agreement with experimental data is satisfactory.

  • Received 18 October 1982

DOI:https://doi.org/10.1103/PhysRevB.27.4760

©1983 American Physical Society

Authors & Affiliations

P. B. Allen

  • Department of Physics, State University of New York at Stony Brook, Stony Brook, New York 11794

M. Cardona

  • Max-Planck-Institut für Festkörperforschung, Heisenbergstrasse 1, D-7000 Stuttgart 80, Federal Republic of Germany

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Issue

Vol. 27, Iss. 8 — 15 April 1983

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