Ionization probability of sputtered atoms

N. D. Lang
Phys. Rev. B 27, 2019 – Published 15 February 1983
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Abstract

The ionization probability of atoms sputtered from metal surfaces is discussed with the use of an approach of Blandin, Nourtier, and Hone. A general expression is obtained for this probability for the case in which the energy position of the sputtered-atom valence level has a linear dependence on distance and the atom velocity is constant. A limiting form of this expression was given by Brako and Newns; this limiting form is very useful in analyzing the higher-velocity part of the data obtained by Yu for O sputtered from transition-metal surfaces. Analysis of the lower-velocity part of the data proceeds by the combination of the more general formulation of the theory with a very simple trajectory determined on the basis of a Morse-potential interaction between the sputtered adatom and the substrate atom which strikes it. A good account of Yu's experimental data is obtained with the use of parameter values determined solely from measurements and calculations of the ground-state properties of oxygen adsorbed on metal surfaces.

  • Received 21 September 1982

DOI:https://doi.org/10.1103/PhysRevB.27.2019

©1983 American Physical Society

Authors & Affiliations

N. D. Lang

  • IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

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Issue

Vol. 27, Iss. 4 — 15 February 1983

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